This work demonstrates a promising method to fabricate periodic nanovein structures, which can be served as templates for fabricating photonic crystals possessing a large complete photonic bandgap. First, the fabrication of a one-dimensional grating structure connected with nanolines is demonstrated by controlling the exposure dosage of the second exposure of the two-exposure two-beam interference technique. Secondly, by using the same interference technique but setting each exposure under the same exposure dosage, two-dimensional periodic structures with nanovein connections were fabricated. These structures were obtained by using either a pure negative photoresist with very low concentration of photoinitiator or a mixing of a negative and a positive photoresists. The fabricated structures are not, as usual, a duplication of the interference pattern but are constituted by square or triangular rods connecting with narrow veins. They can be used as templates for fabricating photonic crystals with very large complete photonic bandgap. © 2009 Optical Society of America.

Lai N.D., Huang Y.D., Lin J.H., Do D.B., Hsu C.C.

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Từ khóa : Crystal atomic structure; Energy gap; Fabrication; Holographic interferometry; Lithography; Periodic structures; Photoresistors; Spontaneous emission; Surface treatment; Fabricated structures; Interference patterns; Low concentrations; Nanolines; Negative photoresists; One-dimensional gratings; Photoinitiator; Photonic band-gap; Two-beam interferences; Two-dimensional periodic structures; Photonic crystals