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The preparation and gas sensitive property of Pt-WO3 thin film

The WO3 semiconductor thin film was prepared on glass substrate by thermal evaporation techniques and a metal Pt layer was coated on the film surface. The structural analysis of the film was carried out using an X-ray diffractometer D5000 (Siemens). The hydrochromic properties of Pt-WO3 thin film at the wavelength range from 0.5 to 2.8 μm in an atmosphere containing different hydrogen concentrations were investigated. The maximum sensitivity was observed at a wavelength of approx. 1.2 μm by optical density measurement. © 1998 Elsevier Science S.A. All rights reserved.


 Nha V.N., Ngoc N.T.B., Hung V.N.
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  Từ khóa : Density measurement (optical); Evaporation; Film preparation; Hydrogen; Semiconducting glass; Thin films; Tungsten compounds; X ray diffraction analysis; Thermal evaporation; Semiconducting films